Document Type
Article
Version Deposited
Published Version
Publication Date
9-6-2017
Publication Title
Beilstein Journal of Nanotechnology
DOI
10.3762/bjnano.8.187
Abstract
Visible-light irradiation of phthalimide esters in the presence of the photosensitizer [Ru(bpy)3]2+ and the stoichiometric reducing agent benzyl nicotinamide results in the formation of alkyl radicals under mild conditions. This approach to radical generation has proven useful for the synthesis of small organic molecules. Herein, we demonstrate for the first time the visible-light photosensitized deposition of robust alkyl thin films on Au surfaces using phthalimide esters as the alkyl radical precursors. In particular, we combine visible-light photosensitization with particle lithography to produce nanostructured thin films, the thickness of which can be measured easily using AFM cursor profiles. Analysis with AFM demonstrated that the films are robust and resistant to mechanical force while contact angle goniometry suggests a multilayered and disordered film structure. Analysis with IRRAS, XPS, and TOF SIMS provides further insights.
Recommended Citation
Quarels, R. D.; Zhai, X.; Kuruppu, N.; Hedlund, J. K.; Ellsworth, A. A.; Walker, A. V.; Garno, J. C.; Ragains, J. R. Beilstein J. Nanotechnol. 2017, 8, 1863–1877. doi:10.3762/bjnano.8.187
Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 International License.
Comments
This is an Open Access article under the terms of the Creative Commons Attribution License.