A patterning process utilizing a nanoimprint lithography for fabrication of planar perpendicular patterned magnetic media

Author(s)

Robert Grove III, Rowan University

Date Approved

10-21-2005

Embargo Period

4-12-2016

Document Type

Thesis

Degree Name

M.S. in Engineering

Department

Electrical & Computer Engineering

College

Henry M. Rowan College of Engineering

Advisor

Krchnavek, Robert

Subject(s)

Lithography--Technique; Magnetic devices; Nanoimprint lithography

Disciplines

Electrical and Computer Engineering

Abstract

This thesis describes the results of applied research in the area of patterned magnetic media. Current magnetic media is pushing the physical limits of magnetic bits by compressing them into very small spaces - a process that will eventually be hampered by the superparamagnetic effect. The superparamagnetic effect will require the magnetic media industry to find a modified method of storing magnetic bits. Perpendicular patterned magnetic media could be the method of choice for future generations of magnetic data storage. Patterning magnetic media allows bits to be stored in isolated magnetic islands instead of in a continuous magnetic surface, as is currently the case. Separating the bits increases signal to noise ratio and bit density at the same time. As the first step in fabricating patterned magnetic media, this research demonstrates the ability to pattern a 60 nanometer thick film of polymethyl methacrylate (PMMA) into 45 nanometer high pillars with a density correlating to 258 Gbits/in²over a 100 μm² area.

Recommended Citation

Grove, Robert III, "A patterning process utilizing a nanoimprint lithography for fabrication of planar perpendicular patterned magnetic media" (2005). Theses and Dissertations. 1005.
https://rdw.rowan.edu/etd/1005